Test and Research of Silicon Materials in Integrated device Engineering

Authors

  • Chuan-Zheng Yang

polycrystalline and monocrystal silicon, crystal defects, induced slip dislocations

Abstract

It is of great practical significance to test and analyze the quality of silicon materials used in integrated devices and their changes in planar thermal process. This paper summarizes the international test, analysis and research results. The contents include polycrystal preparation, single crystal growth and its crystal defects, wafer cutting, grinding and polishing, wafer tracking observation and analysis in plane thermal process, generation control and elimination of induced dislocations, etc.

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How to Cite

Test and Research of Silicon Materials in Integrated device Engineering. (2023). Global Journal of Science Frontier Research, 23(A4), 59-87. https://www.journalofscience.org/index.php/GJSFR/article/view/102673

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Test and Research of Silicon Materials in Integrated device Engineering

Published

2023-07-11

How to Cite

Test and Research of Silicon Materials in Integrated device Engineering. (2023). Global Journal of Science Frontier Research, 23(A4), 59-87. https://www.journalofscience.org/index.php/GJSFR/article/view/102673